SEMs Allow Imaging Down to Nanometer Level

FEI Company's Nova NanoSEM 50 Series of ultra-high resolution scanning electron microscopes (UHR SEMs) provides nm-scale resolution and ultra-precise analysis on a range of samples. 

One instrument allows imaging down to the nanometer level, high beam current for fast and precise analysis, and low vacuum capability to extend the range of sample types and minimize preparation requirements. In low vacuum, the Nova NanoSEM can examine highly insulating samples, up to nearly the same resolution that can be achieved in high vacuum, with little or no preparation, eliminating artifacts and saving time.

The series builds on the success of previous Nova NanoSEM instruments, and inherits its beam deceleration and low vacuum capabilities (including the Helix detector for unequalled high-contrast, low-noise imaging) from previous-generation instruments. It features integrated sample and chamber cleaning solutions, critical for low kV high-resolution imaging, and its advanced and intuitive sample navigation and user interface. It also features a universal large chamber, 16-bit scan engine and latest scanning strategies, as well as the high-precision stage, which were first deployed in the Nova and Helios NanoLab DualBeam systems. The new series introduces a suite of detectors, retractable and in-lens, for optimized secondary electron (SE), backscattered electron (BSE), and scanning transmission electron microscopy (STEM) signal collection and filtering.

The Nova NanoSEM 450 is suited for advanced material science applications. Its 110-mm stage with up to 75-degree motorized tilt accepts a range of sample sizes and configurations, and permits electron back-scattered diffraction (EBSD) analysis without pre-tilted holders.

The Nova NanoSEM 650 offers a high-precision 150-mm piezo-electric stage for fast, precise navigation, providing 100 percent coverage of six-inch wafers or masks, and substatial coverage of 8" samples. Fast beam blanking, integrated 16-bit pattern generator, and a variety of beam chemistries for e-beam deposition make it ideal for prototyping and lithography applications. Both instruments provide 1-nm resolution at 15 kV, 1.4 nm at 1 kV, and beam currents up to 200 nA.

For more information, please visit http://fei.com/nova-nanosem-50

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