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Simultaneous Observation with Dual View Macroscope

Leica FS MOffering convenience, optical performance, and flexibility, the Leica FS M is a universal macroscope for high-precision firearm and toolmark examinations. The versatile system can be configured with dual viewing accessories, which is ideal for the simultaneous observation of evidence during training and consultation. The manually-operated macroscope complements the motorized, automatic comparison macroscope and meets the needs of users.

The stable comparison bridge supports two precisely matched sets of apochromatically-corrected objectives on the five-position, ball-bearing nosepieces. The bridge is opto-mechanically designed to provide a variety of different views: split image, full left, and full right, as well as superimposed imaging of specimens on each macroscope stage. By rotating the convenient split image control, the viewing field can be continuously adjusted between the left and right specimen. Full left or full right viewing and switching between all imaging modes takes less than one second.

The system’s stability and optics provide a 22 mm field of view with erect, unreversed images. When manipulating a specimen on a macroscope stage, the image seen through the objectives moves in the same direction as the specimen on the stage. This allows fast, easy manipulation of a specimen while viewing.

The macroscope features telecentric objectives with built-in iris diaphragms to further enhance image contrast and increase the depth of field. All objectives are long working distance and apochromatically-corrected for the ultimate high contrast reproduction of evidence. The parfocal and parcentric objectives allow quick examination of specimens in discrete magnifications from 4x to 160x without complicated, time-consuming refocusing when switching from one objective to another.

The macroscope can be configured with a variety of light sources, including LED and fiber optic illumination. Fluorescent tube systems mounted on articulated arms or gooseneck supports allow easy and precisely positioned for the best specimen illumination. Filters are available to help reduce glare and provide more even illumination and color balance for high-quality digital image recording. The user can select multiple mounting locations for any illumination source, which enables reverse lighting techniques for toolmark examination, among other techniques.

Leica Microsystems Inc.
2345 Waukegan Rd.
Bannockburn IL 60015
Phone: 847-405-0123
Fax: 847-405-0164
http://www.leica-microsystems.com

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