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Gas Analysis for Semiconductor Industry

Gas analyzers and an extensive library of calibrations and methods are available for use in a variety of tool effluent matrices from CVD chamber cleans to CU CVD depositions. EPA Method 320 represents official acceptance of FTIR as an analytical technique for emissions monitoring. Proprietary dual gas cell systems allow inlet and outlet streams from wet scrubbers, point-of-use scrubbers, thermal oxidizers, and other VOC abatement devices to be assessed simultaneously. V Series systems are designed for detection of low levels of moisture or impurities in corrosive gases. Aries roaming air monitoring systems and Titan-EM fixed, multi-point analyzers are used in industrial hygiene applications at semiconductor manufacturing facilities.
MIDAC Corporation
130 McCormick Ave. #111
Costa Mesa, CA, 92626